University of Bologna

Dipartimento di Elettronica, Informatica e Sistemistica

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Searched for "MicroTAS2004:Vulto"
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(Conference)

DRY FILM RESIST FOR FAST FLUIDIC PROTOTYPING

P.Vulto and N. Glade and L. Altomare and J. Bablet and G. Medoro and Leonardi and A. Romani and I. Chartier and N. Manaresi and M. Tartagni and R.Guerrieri

Abstract:

Dry film photoresist is used for creating microfluidic structures by sandwiching the patterned resist in between of two substrates. The technique is applied for creating hybrid biochips for dielectrophoretic cell manipulation. Multiple level lithography is demonstrated and biocompatibility of the resist is proven. Due to simple fabrication procedures the resist can be processed in a lowtech environment.

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